Physical Vapor Deposition | Application

Physical Vapor Deposition (PVD), also known as PVD, is a method of depositing thin films on semiconductor manufacturing processes, cutting tools, and molds. Other deposition methods include resistive vapor deposition, electron beam deposition, molecular beam epitaxy, ion plating, ion beam deposition, and sputtering.

Matsusada Precision manufactures and sells power supplies for PVD and other vapor deposition systems.

Recommended products

RK series

voltage range: 6 to 800 V

current: 0.6 to 180 A

power: 385 to 1200 W

Versatile benchtop
DC power supply

Available for 400 W output while being the small size of only 2.8-inch in width.

RE series

voltage range: 10 to 650 V

current: 1.2 to 1200 A

power: 0.75 to 15 kW

147 models, programmable DC Power Supply

Low noise, High power, compact and high efficiency

REK/REKJ series

voltage range: 6 to 1500 V

current: 1.2 to 1200 A

power: 0.77 to 15 kW

Versatile, High-performance
DC power supply

Compact and High power, PFC circuit and universal input. Various operations are available

PRT series

voltage range: 80 to 1500 V

current: 33 to 510 A

power: 5 to 15 kW

High Power Autoranging DC Power Supply

Achieve a autoranging of output, Variable internal resistance function

R4G/R4GN series

voltage range: 6 to 650 V

current: 0.1 to 10 A

power: 12 to 180 W

Compact and High resolution
Linear DC power supply

High resolution and Ultra low noise, Digital interface

AU series

voltage range: 1 to 120 kV

current: 0.25 to 2200 mA

power: 30 to 2200 W

Rack mount High Voltage DC Power Supply

Choose from over 300 available models of the low-profile, lightweight design from the AU series, offering remote control & monitor functions; digital interface available.