Ion implantation is a materials modification technique wherein ionized atoms or molecules are accelerated and injected into a solid substrate, thereby altering its physical or chemical properties, or modifying its surface. A primary application of this technique involves the introduction of impurity elements, known as dopants, into semiconductor materials. This process, referred to as doping, is one of the most prevalent ion implantation techniques utilized in the semiconductor industry.
A typical ion implanter comprises several key components: an ion source to generate the desired ions; a mass analyzer to select and separate the specific ions; an accelerator tube to energize the ions to the required energy levels; a scanning system to uniformly distribute the ion beam across the substrate; and a dose control system to accurately monitor and regulate the implanted ion quantity. The end station, where the implantation of ions into the solid material occurs, is maintained under high vacuum conditions to ensure process integrity and prevent beam scattering or contamination.
Matsusada Precision offers a comprehensive portfolio of high-voltage power supplies engineered for diverse applications within ion implantation systems. This portfolio includes: high-voltage filament power supplies for ion sources, extraction grid power supplies, precision constant current power supplies for analyzer magnets, high-voltage power supplies for accelerator tubes (supporting energies up to 200 kV), high-speed bipolar power supplies for ion beam scanning systems, and power supplies for secondary electron suppression.
| Company | WEB site | Models |
|---|---|---|
| Applied Materials | Ion Implant |
VIISTA® 3000XP VIISTA® 900 3D VIISTA® 900XP VIISTA® HCP VIISTA® PLAD VIISTA® TRIDENT |
| Varian Semiconductor Equipment (now Applied Materials) |
||
| Axcelis | Ion Implantation | Purion Ion Implanters |
Purion H Purion Dragon Purion H200 Purion XE Purion EXE Purion VXE Purion Xemax Purion XE Purion M |
| Nissin | Nissin Ion Equipment Co., Ltd. |
IMPHEAT EXCEED400HY EXCEED3000AH/-Ev/-Evo/-Evo2 EXCEED9600A/-Ev/-Evo/-Evo2 |
| SEN | Sumitomo Heavy Industries Ion Technology Co., Ltd. |
SHX-Ⅲ(HC) NV-GSDⅢ-180 MC3-Ⅱ(MC) S-UHE(HE) SS-UHE(HE) Saion |
| Ulvac | ULVAC - Ion Implanters |
IMX-3500 SOPHI-200/260 IH-860 |
| AIBT | Advanced Ion Beam Technology, Inc. AIBT | iPulsar Plus |
- Related words:
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- vacuum
- ion
- electromagnet
- accelerator
- surface modification
- mass spectrometry
- scanning
- semiconductor
- dose volume
- doping
- beamline
- Faraday cup
- annealing
- channeling effect
- amorphization
Recommended products
Matsusada Precision offers a wide variety of high voltage power supplies such as high voltage filament power supplies for ion sources, high voltage power supplies for extraction grids, constant current power supplies for analyzer magnets, high voltage power supplies up to 200kV for ion acceleration, fast high voltage bipolar power supplies for ion beam scanning, and high voltage power supplies for secondary electron suppression.
