Ion implantation is a method of changing the properties of a solid or modifying its surface by accelerating and injecting ionized atoms or molecules into the solid. A common application of this method is the introduction of impurity elements--called dopants--into semiconductors. This process, known as doping, is one of the most widely used forms of ion implantation in the semiconductor industry.
A typical ion implanter consists of several parts, including an ion source to generate the target ions, a mass analyzer to extract the necessary ions, an accelerator tube to accelerate the ions, a scanning section to scan the ion beam, and a section to detect the dose. The end station, where ions are injected into the solid, is under high vacuum conditions.
Matsusada Precision offers a wide range of high-voltage power supplies for various parts of the ion implantation system. These include high-voltage filament power supplies for ion sources, extraction grid power supplies, constant current power supplies for analyzer magnets, high-voltage accelerators up to 200 kV, fast bipolar power supplies for ion beam scanning, and power supplies for secondary electron suppression.
| Company | WEB site | Models |
|---|---|---|
| Applied Materials | Ion Implant |
VIISTA® 3000XP VIISTA® 900 3D VIISTA® 900XP VIISTA® HCP VIISTA® PLAD VIISTA® TRIDENT |
| Varian Semiconductor Equipment (now Applied Materials) |
||
| Axcelis | Ion Implantation | Purion Ion Implanters |
Purion H Purion Dragon Purion H200 Purion XE Purion EXE Purion VXE Purion Xemax Purion XE Purion M |
| Nissin | Nissin Ion Equipment Co., Ltd. |
IMPHEAT EXCEED400HY EXCEED3000AH/-Ev/-Evo/-Evo2 EXCEED9600A/-Ev/-Evo/-Evo2 |
| SEN | Sumitomo Heavy Industries Ion Technology Co., Ltd. |
SHX-Ⅲ(HC) NV-GSDⅢ-180 MC3-Ⅱ(MC) S-UHE(HE) SS-UHE(HE) Saion |
| Ulvac | ULVAC - Ion Implanters |
IMX-3500 SOPHI-200/260 IH-860 |
| AIBT | Advanced Ion Beam Technology, Inc. AIBT | iPulsar Plus |
- Related words:
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- vacuum
- ion
- electromagnet
- accelerator
- surface modification
- mass spectrometry
- scanning
- semiconductor
- dose volume
- doping
- ion beam implantation
Recommended products
Matsusada Precision offers a wide variety of high voltage power supplies such as high voltage filament power supplies for ion sources, high voltage power supplies for extraction grids, constant current power supplies for analyzer magnets, high voltage power supplies up to 200kV for ion acceleration, fast high voltage bipolar power supplies for ion beam scanning, and high voltage power supplies for secondary electron suppression.
