A focused ion beam (FIB) system scans a sample surface with an extremely thin, focused ion beam.
Ion beam scanning is used for sample surface observation, sputtering, deposition, etching, cross-sectional processing observation for Scanning Electron Microscope (SEM), sample preparation for Transmission Electron Microscopy (TEM), and film forming by deposition.
The ability to precisely irradiate ion beams can also be used to repair defective areas or remove additional areas of photomasks for semiconductor manufacturing equipment.
The focused ion beam photomask repair system is specialized in focused ion beam (FIB) technology.
In the ion source, ions are extracted by applying an electric field between gallium Liquid Metal Ion Sources (LMIS) and extraction electrodes. When the extracted ions are accelerated by the high-voltage electric field of the lens section and collide with the sample, secondary electrons and atoms are emitted. The beam can be narrowed by increasing the acceleration voltage of the lens section. However, at the same time, damage to the sample will increase. Therefore, the acceleration voltage is generally +5kV to +30kV.
Matsusada Precision's High Voltage Power Supplies such as HIB series provide multiple outputs and high stability designed for ion beam application.
We also have a selection of low-noise, high-voltage modular power supplies and onboard high-voltage power supplies for ion source extraction electrodes, and ion acceleration.
- Related words:
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- Focused Ion Beam
- Sputtering
- Etching
- Cross-sectional processing observation
- TEM sample preparation
- Film deposition
- Photomask
- Mask repair
- High voltage power supply
- Ion beam power supply
- Low noise power supply
Recommended products
We also have a selection of low-noise, high-voltage modular power supplies and onboard high-voltage power supplies for ion source extraction electrodes, and ion acceleration.
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