Electron Beam (E-Beam) Evaporation, also known as Electron Beam Physical Vapor Deposition (EBPVD), is a technique used for depositing thin films of material onto a substrate. In this process, a high-energy electron beam, generated from a filament, is directed at a source material (target) within a vacuum. The intense heat causes the material to vaporize. The resulting vapor then travels and condenses on a substrate to form a uniform thin film. The process utilizes a high acceleration voltage, typically ranging from a few kilovolts (kV) up to 40 kV or more, depending on the specific application and material.
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